Ion cyclotron resonance heating fast and slow wave excitation and power deposition in edge plasmas with application to ITER

A. Messiaen, V. Maquet, J. Ongena

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Samenvatting

The antenna power coupling to the plasma centre and its possible deleterious coupling to the plasma edge are key parameters in an ion cyclotron resonance heating system. The influence on these parameters by the confluence between the slow and the fast magnetosonic waves is studied for the case of large machines. Until now, the modelling of the scrape off layer region has been calculated by ANTITER II, which contains only the fast wave description and where the confluence with the slow wave (S wave) is approximated by the Alfvén resonance. In the present study, a complete modelling of the slow and fast waves is made by ANTITER IV. The modelling by the two codes is compared and shows the important role of the Alfvén and the lower hybrid resonances for the excitation of large fields and associated power deposition at the edge of the plasma even far from the antenna location. The ANTITER IV modelling is thereafter applied to the case of the ITER antenna with a reference density profile and heating parameters. A comparative study is made for the edge power deposition and the excitation of large fields for different toroidal phasing cases of the antenna. This study also takes into account the tilting of the antenna array with respect to the total magnetic field in front of the antenna. If the Faraday screen is field-aligned, the excitation of the S wave occurs at the wave confluence; however, in the case of non-alignment the antenna directly excites the S wave. This effect is studied and quantified. All edge effects, even the direct excitation of S waves, can be strongly reduced by tailoring the current distribution in the straps of the antenna array. Resulting cases for the minimisation of edge power deposition in ITER and the reactor are studied.

Originele taal-2Engels
Artikelnummer045021
TijdschriftPlasma Physics and Controlled Fusion
Volume63
Nummer van het tijdschrift4
DOI's
StatusGepubliceerd - apr. 2021

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