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Generation and suppression of runaway electrons in disruption mitigation experiments in TEXTOR

  • S. A. Bozhenkov
  • , M. Lehnen
  • , K. H. Finken
  • , M. W. Jakubowski
  • , R. C. Wolf
  • , R. Jaspers
  • , M. Kantor
  • , O. V. Marchuk
  • , E. Uzgel
  • , G. Van Wassenhove
  • , O. Zimmermann
  • , D. Reiter
  • FORSCHUNGSZENTRUM JULICH GMBH
  • Max Planck Institute for Plasma Physics
  • FOM-Instituut voor Plasmafysica 'Rijnhuizen'
  • Ioffe Physical-Technical Institute of the Russian Academy of Sciences

Onderzoeksoutput: Bijdrage aan een tijdschriftArtikelpeer review

91 Citaten (Scopus)

Samenvatting

Runaway electrons represent a serious problem for the reliable operation of the future experimental tokamak ITER. Due to the multiplication factor of exp(50) in the avalanche even a few seed runaway electrons will result in a beam of high energetic electrons that is able to damage the machine. Thus suppression of runaway electrons is a task of great importance, for which we present here a systematic study of runaway electrons following massive gas injection in TEXTOR. Argon injection can cause the generation of runaways carrying up to 30% of the initial plasma current, while disruptions triggered by injection of helium or of mixtures of argon (5%, 10%, 20%) with deuterium are runaway free. Disruptions caused by argon injection finally become runaway free for very large numbers of injected atoms. The appearance/absence of runaway electrons is related to the fraction of atoms delivered to the plasma centre. This so-called mixing efficiency is deduced from a 0D model of the current quench. The estimated mixing efficiency is 3% for argon, 15% for an argon/deuterium mixture and about 40% for helium. A low mixing efficiency of high-Z impurities can have a strong implication for the design of the disruption mitigation system for ITER. However, a quantitative prediction requires a better understanding of the mixing mechanism.

Originele taal-2Engels
Artikelnummer105007
TijdschriftPlasma Physics and Controlled Fusion
Volume50
Nummer van het tijdschrift10
DOI's
StatusGepubliceerd - 1 okt. 2008

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