Electrodeposition for the synthesis of microsystems

W. Ruythooren; K. Attenborough; S. Beerten; P. Merken; J. Fransaer; E. Beyne; C. Van Hoof; J. De Boeck; J. P. Celis

doi:10.1088/0960-1317/10/2/301

Electrodeposition for the synthesis of microsystems

W. Ruythooren
, K. Attenborough
, S. Beerten
, P. Merken
, J. Fransaer
, E. Beyne
, C. Van Hoof
, J. De Boeck
, J. P. Celis

Communication, Information, Systems and Sensors

KU Leuven
Interuniversitair Micro-Electronica Centrum vzw

Onderzoeksoutput: Bijdrage aan een tijdschrift › Congresartikel › peer review

79 Citaten (Scopus)

Samenvatting

Electroplating is an emerging technique for the production of microsystems. This is due to advantages such as high rate of deposition, high resolution, high shape fidelity, simple scalability, and good compatibility with existing processes in microelectronics. Materials ranging from high-conductivity metals over soldering connections to ferromagnets can be deposited. In this paper the basics of electroplating are reviewed and examples of recent applications of electroplating in the processing of microsystems are presented.

Originele taal-2	Engels
Pagina's (van-tot)	101-107
Aantal pagina's	7
Tijdschrift	Journal of Micromechanics and Microengineering
Volume	10
Nummer van het tijdschrift	2
DOI's	https://doi.org/10.1088/0960-1317/10/2/301
Status	Gepubliceerd - jun. 2000
Evenement	The 10th Micromechanics Europe Workshop (MME'99) - Gif sur Yvette, France Duur: 27 sep. 1999 → 28 sep. 1999

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title = "Electrodeposition for the synthesis of microsystems",

abstract = "Electroplating is an emerging technique for the production of microsystems. This is due to advantages such as high rate of deposition, high resolution, high shape fidelity, simple scalability, and good compatibility with existing processes in microelectronics. Materials ranging from high-conductivity metals over soldering connections to ferromagnets can be deposited. In this paper the basics of electroplating are reviewed and examples of recent applications of electroplating in the processing of microsystems are presented.",

author = "W. Ruythooren and K. Attenborough and S. Beerten and P. Merken and J. Fransaer and E. Beyne and \{Van Hoof\}, C. and \{De Boeck\}, J. and Celis, \{J. P.\}",

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AU - Ruythooren, W.

AU - Attenborough, K.

AU - Beerten, S.

AU - Merken, P.

AU - Fransaer, J.

AU - Beyne, E.

AU - Van Hoof, C.

AU - De Boeck, J.

AU - Celis, J. P.

PY - 2000/6

Y1 - 2000/6

N2 - Electroplating is an emerging technique for the production of microsystems. This is due to advantages such as high rate of deposition, high resolution, high shape fidelity, simple scalability, and good compatibility with existing processes in microelectronics. Materials ranging from high-conductivity metals over soldering connections to ferromagnets can be deposited. In this paper the basics of electroplating are reviewed and examples of recent applications of electroplating in the processing of microsystems are presented.

AB - Electroplating is an emerging technique for the production of microsystems. This is due to advantages such as high rate of deposition, high resolution, high shape fidelity, simple scalability, and good compatibility with existing processes in microelectronics. Materials ranging from high-conductivity metals over soldering connections to ferromagnets can be deposited. In this paper the basics of electroplating are reviewed and examples of recent applications of electroplating in the processing of microsystems are presented.

UR - https://www.scopus.com/pages/publications/0033700462

U2 - 10.1088/0960-1317/10/2/301

DO - 10.1088/0960-1317/10/2/301

M3 - Conference article

AN - SCOPUS:0033700462

SN - 0960-1317

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EP - 107

JO - Journal of Micromechanics and Microengineering

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T2 - The 10th Micromechanics Europe Workshop (MME'99)

Y2 - 27 September 1999 through 28 September 1999

ER -

Electrodeposition for the synthesis of microsystems

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