Recent progress on improving ICRF coupling and reducing RF-specific impurities in ASDEX Upgrade

Wei Zhang, Volodymyr Bobkov, Jean Marie Noterdaeme, Wouter Tierens, Diogo Aguiam, Roberto Bilato, David Coster, Laurent Colas, Kristel Crombé, Helmut Fuenfgelder, Helmut Faugel, Yuhe Feng, Jonathan Jacquot, Philippe Jacquet, Arne Kallenbach, Ana Kostic, Tilmann Lunt, Riccardo Maggiora, Roman Ochoukov, Antonio SilvaGuillermo Suárez, Angelo A. Tuccilo, Onofrio Tudisco, Mariia Usoltceva, Dirk Van Eester, Yongsheng Wang, Qingxi Yang

Laboratory for Plasma Physics

Max-Planck-Institut für Plasmaphysik
University of Ghent
Institute of Plasma Physics Chinese Academy of Sciences
Instituto Superior Técnico
Commissariat à l'Énergie Atomique (CEA)
Culham Centre for Fusion Energy
Politecnico di Torino
ENEA Centro Ricerche Frascati

Publikation: Beitrag in Fachzeitschrift › Konferenzartikel › Begutachtung

sortieren
Gewicht:
Alphabetisch

Recent progress on improving ICRF coupling and reducing RF-specific impurities in ASDEX Upgrade

Fingerprint

Engineering