Development of a Si:As blocked impurity band detector for far IR detection

Deniz S. Tezcan, Jan Putzeys, Koen De Munck, Tim Souverijns, Patrick Merken, Paolo Fiorini, Chris Van Hoof, Thierry Dartois, Claude Israbian, Stephan M. Birkmann, Jutta Stegmaier, Ulrich Grözinger, Oliver Krause, Piet De Moor

Publikation: Beitrag in Buch/Bericht/KonferenzbandKonferenzbeitragBegutachtung

Abstract

This paper reports on the fabrication and characterization of a linear array of Blocked Impurity Band (BIB) far infrared detectors and of the related Cryogenic Readout Electronics (CRE). It is part of the ESA DARWIN project which aims at the study of exoplanets by means of null interferometry and requires high performance infrared detector arrays in the 6-18μm range. Si:As BIB detectors have been fabricated on an infrared transparent Silicon substrate enabling backside illumination. The buried contact, the active and the blocking layers are deposited by epitaxy; the doping profile is controlled by adjusting the growth parameters. Access to the buried contact is provided by anisotropic silicon etch of V-grooves in the epi layers. Spray coating of photoresist is used for the lithography of the wafers with high topography. The CRE is composed of an input stage based on an integrating amplifier in AC coupled feedback with selectable integrator capacitors, of a sample and hold stage which provides isolation between input and sampling capacitance, and of an output buffer with multiplexing switch. The readout is optimized for low noise with minimum operating temperature of 4K. Linear arrays made of 42 and 88 detectors and having 30μm pixel pitch with various active areas are fabricated. Detector arrays are coupled to the CRE by Indium bumps using flip-chip technology. Measurements on the readout show reduced noise, good linearity and dynamic range. First detector characterization results are presented.

OriginalspracheEnglisch
TitelInfrared Systems and Photoelectronic Technology II
DOIs
PublikationsstatusVeröffentlicht - 2007
VeranstaltungInfrared Systems and Photoelectronic Technology II - San Diego, CA, USA/Vereinigte Staaten
Dauer: 26 Aug. 200728 Aug. 2007

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band6660
ISSN (Print)0277-786X

Konferenz

KonferenzInfrared Systems and Photoelectronic Technology II
Land/GebietUSA/Vereinigte Staaten
OrtSan Diego, CA
Zeitraum26/08/0728/08/07

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